# Next Generation Extreme Ultraviolet Photolithography: EUV-NA

**URL:** <https://scanalyst.fourmilab.ch/t/next-generation-extreme-ultraviolet-photolithography-euv-na/815>\
**Category:** The Happening World\
**Tags:** asml, extreme-ultraviolet, semiconductor-fabrication\
**Created:** [1 February 2022 13:14 UTC](https://scanalyst.fourmilab.ch/t/next-generation-extreme-ultraviolet-photolithography-euv-na/815 "2022-02-01T13:14:28Z")\
**Posts on this page:** 1\
**Page:** 1

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**Author:** ![johnwalker](https://scanalyst.fourmilab.ch/user_avatar/scanalyst.fourmilab.ch/johnwalker/32/17415_2.png) [@johnwalker](https://scanalyst.fourmilab.ch/u/johnwalker)\
**Post date:** [1 February 2022 13:14 UTC](https://scanalyst.fourmilab.ch/t/next-generation-extreme-ultraviolet-photolithography-euv-na/815/1 "2022-02-01T13:14:28Z")

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[![](https://scanalyst.fourmilab.ch/uploads/default/original/2X/8/8626da9c50223b14bda548d1f7430bf0541efc8d.jpeg "What ASML Has Next After EUV") ](https://www.youtube.com/watch?v=en7hhFJBrAI)

In order to further reduce the size of features on integrated circuits and thus increase transistor counts, tricks such as [multiple patterning](https://en.wikipedia.org/wiki/Multiple_patterning) will be required. These run the risk of reducing throughput in the photolithography process, driving up costs. One way to avoid this is to increase the [numerical aperture](https://en.wikipedia.org/wiki/Numerical_aperture) (NA) of the optical system that exposes the photoresist on the silicon wafer. This, in turn, requires a whole bag of dirty tricks and over-the-top optics, with the next generation photolithography machines which will use it expected to be around the size of a school bus and cost around US$ 300 million a pop. First customer deliveries by [ASML](https://en.wikipedia.org/wiki/ASML_Holding) are expected in late 2022.